Metal Organic Chemical Vapor Deposition (MOCVD)

AIXTRON Flip top Closed Couple Showerhead MOCVD Reactor for 1x6" 1x4" 6x2" Nitride-based materials

AIXTRON Aix200/4 MOCVD Reactor for single 2"/3"/4" As/P/Sb/dilute nitride alloys

AIXTRON Aix2400/G3 HT MOCVD Reactor for 6x2" Nitride-based materials

AIXTRON CCS MOCVD Reactor for 6x2" As/P based materials

Material Deposition and Etching

E-beam Evaporator for Contact Metal Deposition (old)

E-beam Evaporator for Contact Metal Deposition (new)

Inductively Coupled Plasma System for Nitride Dry-Etching

PECVD for Oxide and Nitride Deposition

Rapid Thermal Annealing

RTP-300 Rapid Thermal Processor

Rapid thermal annealing systems(new)

Epilayer Characterizations

Lehighton Contactless Sheet Resistance System

Optical measurement system & assemblies for photoluminescence measurements

Mercury Probe

BIO-RAD ECV Profiler

LED Characterizations

LED Electroluminescence Mapping system


LED Electroluminescence measurement system

Lapping, Polishing and Scribing

Precision lapping and polishing equipment

TECDIA Scribe and break machine

TECDIA (Nanofactor) Grinding and Lapping machine for Sapphire substrate


High temperature Tubular Furnace for LEDs phosphor fabrication

Helium Leak Detector

ULVAC HELIOT Leak Detector

Device Fabrication and Material Characterization Facilities

Nano Fabrication Facility (NFF) at HKUST

Material Characterization and Preparation Facility (MCPF) at HKUST