Facilities
Metal Organic Chemical Vapor Deposition (MOCVD) |
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AIXTRON Flip top Closed Couple Showerhead MOCVD Reactor for 1x6" 1x4" 6x2" Nitride-based materials AIXTRON Aix200/4 MOCVD Reactor for single 2"/3"/4" As/P/Sb/dilute nitride alloys AIXTRON Aix2400/G3 HT MOCVD Reactor for 6x2" Nitride-based materials AIXTRON CCS MOCVD Reactor for 6x2" As/P based materials |
Material Deposition and Etching |
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E-beam Evaporator for Contact Metal Deposition (old) E-beam Evaporator for Contact Metal Deposition (new) Inductively Coupled Plasma System for Nitride Dry-Etching PECVD for Oxide and Nitride Deposition |
Rapid Thermal Annealing |
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RTP-300 Rapid Thermal Processor Rapid thermal annealing systems(new) |
Epilayer Characterizations |
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Lehighton Contactless Sheet Resistance System Optical measurement system & assemblies for photoluminescence measurements |
LED Characterizations |
Lapping, Polishing and Scribing |
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Precision lapping and polishing equipment TECDIA Scribe and break machine TECDIA (Nanofactor) Grinding and Lapping machine for Sapphire substrate |
Others |
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High temperature Tubular Furnace for LEDs phosphor fabrication |
Device Fabrication and Material Characterization Facilities |
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Nano Fabrication Facility (NFF) at HKUST Material Characterization and Preparation Facility (MCPF) at HKUST |