Current Research
Monochromatic high-resolution micro-LED micro-display
1700 pixels per inch (PPI) passive-matrix (PM) blue micro-display and a 400 × 240 active-matrix (AM) blue micro-display Monochromatic high-resolution micro-LED micro-displays have been monolithically fabricated on both GaN-on-Sapphire and GaN-on-Si platforms, including a world-first 1700 pixels per inch (PPI) passive-matrix (PM) blue micro-display and a 400 × 240 active-matrix (AM) blue micro-display.
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A world-first 1700 pixels per inch (PPI) passive-matrix (PM) blue micro-display The first 1700 pixels per inch (PPI) blue passive-matrix light-emitting diodes on silicon micro-displays powered by ASIC with 6-bit grayscale is realized by flip-chip bonding of a micro-LED array onto a CMOS-based ASIC display driver. The micro-display consists of 256 x 192 pixels within a display area of 0.19 inch in diagonal.
Fig.1. (a) I-V curve of single pixel with inset of its light emitting image. (b) Architecture of ASIC driver. Top-down view of (c) ASIC driver and (d) 256 × 192 LEDs array. (e) Final assembly wire-bonded on a flex cable. (f) Source images (top) and its corresponding display images (bottom) on this micro-display. Related publications:
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400 × 240 active-matrix (AM) blue micro-display A blue GaN micro-LED array featuring 400 × 240 pixels with a pixel size of 30 × 30 μm2 was implemented on a single sapphire substrate using monolithic fabrication process. Active-matrix driving was achieved by hybridizing the micro-LED array with a CMOS backplane.
Fig.2. (a) Layout of 400 × 240 LEDs array and (b) zoomed-in image of LED array edge area. (c) I-V curve of single pixel. (d) Final assembly wire-bonded on PCB driving board. (e) 16-level gray scale images shown on this micro-display. Related publications:
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848 ppi active-matrix micro-LED micro-display using GaN-on-Si epi-wafers A 0.55-inch high-brightness high-resolution monolithic GaN-on-Si micro-LED micro-display with a pixel density of 848 ppi is demonstrated. The GaN thin film grown on Si substrate was integrated with a custom-designed Si CMOS driver through Au-Sn flip-chip bonding, in which Si growth substrate was removed using a crack-free wet etching method.
Fig. 3 (a) GaN-thin film integrated with Si CMOS driver after Si growth substrate removal (b) Yield of the Micro-LED micro-display panel and pixel uniformity
Fig. 4 (a) EL spectra and wavelength shift of the micro-LED display under different driven current (b) Color difference in u’v’ space
Fig. 5 (a) Setup of luminance and angular dependence measurement (b) Brightness and LER V.S driven current density (c) The far-field luminance distribution of the micro-LED display
Fig. 6 Original grayscale images and displayed images Related publications:
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64 × 36 active-matrix red LED micro-display A thin film active-matrix red LED micro-display fabricated from AlGaInP-on-GaAs LED epi-wafers is demonstrated. The resolution is 64 × 36 with a 40 μm pixel pitch. The maximum brightness is 23,500 nits at < 0.5 W power consumption.
Fig. 7 (a)Thin film red LED micro-display, (b) Driver PCB and (c) Displayed images Related publications:
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